Helium purifier – Type C/N

Removed impurities: O2, H2O, H2

  • Purification process: adsorption + catalysis
  • Principle: The gas passes through a special catalyst and an adsorbent layer where impurities are removed.
  • Main domain of use: semi-conductor industry, welding gas, protective gases…

Technical information:

  • Flow rate: up to 5 000 Nm3/h
  • Pressure: up to 380 barg
  • Outlet impurity level: < 10 ppb
  • Semi automatic or automatic version (HMI/PLC)

Helium purifier – Type EF

Removed impurities: N2, Ar, O2, CO, CO2, CH4

  • Purification process: cryogenic adsorption
  • Principle: The gas passes through an adsorbent layer at very low temperature.
  • Main domain of use: gas industry, metallurgical industry, titanium industry, nuclear industry…

Technical information:

  • Flow rate: up to 5 000 Nm3/h
  • Pressure: up to 380 barg
  • Outlet impurity level: < 10 ppb
  • Semi automatic or automatic version (HMI/PLC)

Helium purifier – Type TSA

Removed impurity: H2O

  • Purification process: adsorption
  • Principle: The gas passes through an adsorbent layer where H2O is trapped.
  • Main domain of use: All processes that require dry gas

Technical information:

  • Flow rate: up to 50 000 Nm3/h
  • Pressure: up to 380 barg
  • Outlet impurity level: < 10 ppb
  • Semi automatic or automatic version (HMI/PLC)